Stability of SiC-masks for high resolution synchrotron X-ray lithography
| Author: | H. Lüthje, U. Mackens, Ulrich MeschederORCiDGND, B. Matthießen |
|---|---|
| DOI: | https://doi.org/10.1016/0167-9317(86)90027-4 |
| ISSN: | 0167-9317 |
| Parent Title (English): | Microelectronic Engineering |
| Document Type: | Article (peer-reviewed) |
| Language: | English |
| Year of Completion: | 1986 |
| Release Date: | 2018/03/08 |
| Volume: | 05.1986 |
| Issue: | 1-4 |
| First Page: | 39 |
| Open-Access-Status: | Closed Access |
| Licence (German): |  Urheberrechtlich geschützt |