Characterization of silicon open stencil masks in an ion projection lithography machine

Export metadata

Additional Services

Share in Twitter Search Google Scholar
Metadaten
Author:L.-M. Buchmann, Ulrich MeschederORCiDGND, M. Torkler
DOI:https://doi.org/10.1016/0167-9317(91)90110-Y
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1991
Release Date:2018/03/05
Volume:13.1991
Issue:1-4
First Page:353
Last Page:356
Open Access:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG