TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Buchmann, L.-M.
A1  - Mescheder, Ulrich
A1  - Torkler, M.
T1  - Characterization of silicon open stencil masks in an ion projection lithography machine
JF  - Microelectronic Engineering
Y1  - 1991
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/0167-9317(91)90110-Y
DO  - https://doi.org/10.1016/0167-9317(91)90110-Y
VL  - 13.1991
IS  - 1-4
SP  - 353
EP  - 356
ER  -