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Author
Mescheder, Ulrich
(4)
Pongratz, S.
(4)
Huber, H.-L.
(3)
Windbracke, W.
(3)
Mund, F.
(2)
Betz, H.
(1)
Ehrlich, Ch.
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Kohlmann, K.
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Lüthje, H.
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Mackens, U.
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Rohrmoser, W.
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Trube, J.
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1988
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1986
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1989
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Sub‐half‐micron critical dimension control in x‐ray lithography mask technology
(1988)
Huber, H.-L.
;
Pongratz, S.
;
Trube, J.
;
Windbracke, W.
;
Mescheder, Ulrich
;
Mund, F.
Silicon X-ray masks: Pattern placement and overlay accuracy
(1986)
Betz, H.
;
Huber, H.-L.
;
Pongratz, S.
;
Rohrmoser, W.
;
Windbracke, W.
;
Mescheder, Ulrich
Application Of Sic-X-Ray Masks For Fabricating Sub-Micron Devices
(1988)
Mackens, U.
;
Lüthje, H.
;
Mescheder, Ulrich
;
Mund, F.
;
Pongratz, S.
State of the art of pattern placement accuracy of silicon X-ray master masks
(1989)
Pongratz, S.
;
Mescheder, Ulrich
;
Ehrlich, Ch.
;
Huber, H.-L.
;
Kohlmann, K.
;
Windbracke, W.
1
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4