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Lüthje, H. (5)
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Year of publication
1989
(2)
1986
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1988
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1990
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Article (peer-reviewed)
(3)
Conference Proceeding
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English
(4)
German
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Stability of SiC-masks for high resolution synchrotron X-ray lithography
(1986)
Lüthje, H.
;
Mackens, U.
;
Mescheder, Ulrich
;
Matthießen, B.
Application Of Sic-X-Ray Masks For Fabricating Sub-Micron Devices
(1988)
Mackens, U.
;
Lüthje, H.
;
Mescheder, Ulrich
;
Mund, F.
;
Pongratz, S.
Röntgenstrahllithographie: Herstellung einer 0.5 μm Schaltung und Overlayuntersuchungen
(1989)
Mackens, U.
;
Mescheder, Ulrich
;
Lüthje, H.
Fabrication of 0.5 μm NMOS-devices by all level X-ray lithography
(1989)
Mackens, U.
;
Mescheder, Ulrich
;
Mund, F.
;
Lüthje, H.
;
Lifka, H.
;
Juffermans, C.A.H.
;
Woerlee, P.H.
;
Walker, A.J.
X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features
(1990)
Lüthje, H.
;
Bruns, A.
;
Harms, H.
;
Köhler, I.
;
Mescheder, Ulrich
;
Mackens, U.
;
Stuck, T.
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