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Author
Mescheder, Ulrich (3)
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Year of publication
1990 (3)
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Article (peer-reviewed)
(3)
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English
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Influence of X-ray mask repair on pattern placement accuracy
(1990)
Schaffer, H.
;
Mescheder, Ulrich
;
Weigmann, U.
;
Petzold, H.-C.
X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features
(1990)
Lüthje, H.
;
Bruns, A.
;
Harms, H.
;
Köhler, I.
;
Mescheder, Ulrich
;
Mackens, U.
;
Stuck, T.
Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication
(1990)
Mescheder, Ulrich
;
Mackens, U.
;
Lifka, H.
;
Dammel, R.
;
Pawloski, G.
;
Theis, J.
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