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Author
Mund, F. (3)
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Year of publication
1987
(1)
1988
(1)
1989
(1)
Document type
Article (peer-reviewed) (3)
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English
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Linewidth metrology for x-ray masks with subhalfmicron feature size
(1987)
Mescheder, Ulrich
;
Mund, F.
;
Huber, H.-L.
Sub‐half‐micron critical dimension control in x‐ray lithography mask technology
(1988)
Huber, H.-L.
;
Pongratz, S.
;
Trube, J.
;
Windbracke, W.
;
Mescheder, Ulrich
;
Mund, F.
Fabrication of 0.5 μm NMOS-devices by all level X-ray lithography
(1989)
Mackens, U.
;
Mescheder, Ulrich
;
Mund, F.
;
Lüthje, H.
;
Lifka, H.
;
Juffermans, C.A.H.
;
Woerlee, P.H.
;
Walker, A.J.
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