Sub‐half‐micron critical dimension control in x‐ray lithography mask technology

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Author:H.-L. Huber, S. Pongratz, J. Trube, W. Windbracke, Ulrich MeschederGND, F. Mund
ISSN:2166-2754
Parent Title (English):Journal of Vacuum Science & Technology B: Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1988
Release Date:2018/03/08
Volume:06.1988
Issue:6
First Page:2184
Last Page:2189
Access Rights:Frei verfügbar
Licence (German):License LogoEs gilt das UrhG