Sub‐half‐micron critical dimension control in x‐ray lithography mask technology
| Document Type: | Article (peer-reviewed) |
|---|---|
| Author: | H.-L. Huber, S. Pongratz, J. Trube, W. Windbracke, Ulrich MeschederORCiDGND, F. Mund |
| ISSN: | 2166-2754 |
| Parent Title (English): | Journal of Vacuum Science & Technology B: Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena |
| Language: | English |
| Year of Completion: | 1988 |
| Release Date: | 2018/03/08 |
| Volume: | 06.1988 |
| Issue: | 6 |
| First Page: | 2184 |
| Last Page: | 2189 |
| Open-Access-Status: | Open Access |
| Licence (German): |  Urheberrechtlich geschützt |