Investigation Of Linewidth Uniformity In X-Ray Lithography

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Author:Ulrich MeschederORCiDGND, U. Mackens, F. Mund
Parent Title (English):Proceedings of SPIE: Volume 1087; Integrated Circuit Metrology, Inspection, and Process Control III, Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States
Document Type:Conference Proceeding
Year of Completion:1989
Release Date:2018/03/05
First Page:396
Last Page:406
Open Access:Frei verf├╝gbar
Licence (German):License LogoEs gilt das UrhG