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Author
Mackens, U.
(7)
Mescheder, Ulrich
(7)
Lüthje, H.
(5)
Mund, F.
(3)
Lifka, H.
(2)
Bruns, A.
(1)
Dammel, R.
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1989
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Investigation Of Linewidth Uniformity In X-Ray Lithography
(1989)
Mescheder, Ulrich
;
Mackens, U.
;
Mund, F.
Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication
(1990)
Mescheder, Ulrich
;
Mackens, U.
;
Lifka, H.
;
Dammel, R.
;
Pawloski, G.
;
Theis, J.
Fabrication of 0.5 μm NMOS-devices by all level X-ray lithography
(1989)
Mackens, U.
;
Mescheder, Ulrich
;
Mund, F.
;
Lüthje, H.
;
Lifka, H.
;
Juffermans, C.A.H.
;
Woerlee, P.H.
;
Walker, A.J.
Röntgenstrahllithographie: Herstellung einer 0.5 μm Schaltung und Overlayuntersuchungen
(1989)
Mackens, U.
;
Mescheder, Ulrich
;
Lüthje, H.
Application Of Sic-X-Ray Masks For Fabricating Sub-Micron Devices
(1988)
Mackens, U.
;
Lüthje, H.
;
Mescheder, Ulrich
;
Mund, F.
;
Pongratz, S.
Stability of SiC-masks for high resolution synchrotron X-ray lithography
(1986)
Lüthje, H.
;
Mackens, U.
;
Mescheder, Ulrich
;
Matthießen, B.
X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features
(1990)
Lüthje, H.
;
Bruns, A.
;
Harms, H.
;
Köhler, I.
;
Mescheder, Ulrich
;
Mackens, U.
;
Stuck, T.
1
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7