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Author
Lüthje, H. (3)
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Year of publication
1986
(1)
1989
(1)
1990
(1)
Document type
Article (peer-reviewed) (3)
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English
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Fabrication of 0.5 μm NMOS-devices by all level X-ray lithography
(1989)
Mackens, U.
;
Mescheder, Ulrich
;
Mund, F.
;
Lüthje, H.
;
Lifka, H.
;
Juffermans, C.A.H.
;
Woerlee, P.H.
;
Walker, A.J.
Stability of SiC-masks for high resolution synchrotron X-ray lithography
(1986)
Lüthje, H.
;
Mackens, U.
;
Mescheder, Ulrich
;
Matthießen, B.
X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features
(1990)
Lüthje, H.
;
Bruns, A.
;
Harms, H.
;
Köhler, I.
;
Mescheder, Ulrich
;
Mackens, U.
;
Stuck, T.
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