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Author
Huber, H.-L. (4)
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Year of publication
1986
(1)
1987
(1)
1988
(1)
1989
(1)
Document type
Article (peer-reviewed)
(4)
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English
(3)
German
(1)
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State of the art of pattern placement accuracy of silicon X-ray master masks
(1989)
Pongratz, S.
;
Mescheder, Ulrich
;
Ehrlich, Ch.
;
Huber, H.-L.
;
Kohlmann, K.
;
Windbracke, W.
Sub‐half‐micron critical dimension control in x‐ray lithography mask technology
(1988)
Huber, H.-L.
;
Pongratz, S.
;
Trube, J.
;
Windbracke, W.
;
Mescheder, Ulrich
;
Mund, F.
Linewidth metrology for x-ray masks with subhalfmicron feature size
(1987)
Mescheder, Ulrich
;
Mund, F.
;
Huber, H.-L.
Silicon X-ray masks: Pattern placement and overlay accuracy
(1986)
Betz, H.
;
Huber, H.-L.
;
Pongratz, S.
;
Rohrmoser, W.
;
Windbracke, W.
;
Mescheder, Ulrich
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