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Author
Huber, H.-L. (3)
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Year of publication
1986
(1)
1987
(1)
1988
(1)
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Article (peer-reviewed) (3)
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English (3)
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Linewidth metrology for x-ray masks with subhalfmicron feature size
(1987)
Mescheder, Ulrich
;
Mund, F.
;
Huber, H.-L.
Sub‐half‐micron critical dimension control in x‐ray lithography mask technology
(1988)
Huber, H.-L.
;
Pongratz, S.
;
Trube, J.
;
Windbracke, W.
;
Mescheder, Ulrich
;
Mund, F.
Silicon X-ray masks: Pattern placement and overlay accuracy
(1986)
Betz, H.
;
Huber, H.-L.
;
Pongratz, S.
;
Rohrmoser, W.
;
Windbracke, W.
;
Mescheder, Ulrich
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