Investigation Of Linewidth Uniformity In X-Ray Lithography
| Author: | Ulrich MeschederORCiDGND, U. Mackens, F. Mund |
|---|---|
| ISBN: | 0-8194-0122-6 |
| Parent Title (English): | Proceedings of SPIE: Volume 1087; Integrated Circuit Metrology, Inspection, and Process Control III, Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States |
| Document Type: | Conference Proceeding |
| Language: | English |
| Year of Completion: | 1989 |
| Release Date: | 2018/03/05 |
| First Page: | 396 |
| Last Page: | 406 |
| Licence (German): |  Urheberrechtlich geschützt |