UPUR – A Metal-Free Combination of Several UPW Polishing Steps in a Multifunctional Reactor for the Removal of TOC and H2O2 Traces

Export metadata

Additional Services

Share in Twitter Search Google Scholar
Metadaten
Author:D. Gaupp, S. Keav, Philippe Rychen, Thomas OppenländerGND
Parent Title (English):Ultrapure Micro 2018, May 30 - June 1, Austin, Texas, USA
Document Type:Conference Proceeding
Language:English
Year of Completion:2018
Release Date:2018/05/30
Tag:UPW polishing; Ultra pure water; VUV-photoreactor
Access Rights:Frei verfügbar
Licence (German):License LogoEs gilt das UrhG