Linewidth metrology for x-ray masks with subhalfmicron feature size

Export metadata

Additional Services

Share in Twitter Search Google Scholar
Metadaten
Author:Ulrich MeschederGND, F. Mund, H.-L. Huber
DOI:https://doi.org/10.1016/0167-9317(87)90101-8
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1987
Release Date:2018/03/14
Volume:06.1987
Issue:1-4
First Page:653
Last Page:659
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG