Silicon X-ray masks: Pattern placement and overlay accuracy
| Document Type: | Article (peer-reviewed) |
|---|---|
| Author: | H. Betz, H.-L. Huber, S. Pongratz, W. Rohrmoser, W. Windbracke, Ulrich MeschederORCiDGND |
| DOI: | https://doi.org/10.1016/0167-9317(86)90028-6 |
| ISSN: | 0167-9317 |
| Parent Title (English): | Microelectronic Engineering |
| Language: | English |
| Year of Completion: | 1986 |
| Release Date: | 2018/03/08 |
| Volume: | 05.1986 |
| Issue: | 1-4 |
| First Page: | 41 |
| Last Page: | 49 |
| Open-Access-Status: | Closed Access |
| Licence (German): |  Urheberrechtlich geschützt |