Silicon X-ray masks: Pattern placement and overlay accuracy

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Author:H. Betz, H.-L. Huber, S. Pongratz, W. Rohrmoser, W. Windbracke, Ulrich MeschederORCiDGND
DOI:https://doi.org/10.1016/0167-9317(86)90028-6
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1986
Release Date:2018/03/08
Volume:05.1986
Issue:1-4
First Page:41
Last Page:49
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG