State of the art of pattern placement accuracy of silicon X-ray master masks
| Author: | S. Pongratz, Ulrich MeschederORCiDGND, Ch. Ehrlich, H.-L. Huber, K. Kohlmann, W. Windbracke |
|---|---|
| DOI: | https://doi.org/10.1016/0167-9317(89)90027-0 |
| ISSN: | 0167-9317 |
| Parent Title (German): | Microelectronic Engineering |
| Document Type: | Article (peer-reviewed) |
| Language: | German |
| Year of Completion: | 1989 |
| Release Date: | 2018/03/06 |
| Volume: | 09.1989 |
| Issue: | 1-4 |
| First Page: | 117 |
| Last Page: | 120 |
| Open-Access-Status: | Closed Access |
| Licence (German): |  Urheberrechtlich geschützt |