State of the art of pattern placement accuracy of silicon X-ray master masks

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Author:S. Pongratz, Ulrich MeschederGND, Ch. Ehrlich, H.-L. Huber, K. Kohlmann, W. Windbracke
DOI:https://doi.org/10.1016/0167-9317(89)90027-0
ISSN:0167-9317
Parent Title (German):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:German
Year of Completion:1989
Release Date:2018/03/06
Volume:09.1989
Issue:1-4
First Page:117
Last Page:120
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG