Fabrication of 0.5 μm NMOS-devices by all level X-ray lithography
| Author: | U. Mackens, Ulrich MeschederORCiDGND, F. Mund, H. Lüthje, H. Lifka, C.A.H. Juffermans, P.H. Woerlee, A.J. Walker |
|---|---|
| DOI: | https://doi.org/10.1016/0167-9317(89)90020-8 |
| ISSN: | 0167-9317 |
| Parent Title (English): | Microelectronic Engineering |
| Document Type: | Article (peer-reviewed) |
| Language: | English |
| Year of Completion: | 1989 |
| Release Date: | 2018/03/05 |
| Volume: | 09.1989 |
| Issue: | 1-4 |
| First Page: | 89 |
| Last Page: | 92 |
| Open-Access-Status: | Closed Access |
| Licence (German): |  Urheberrechtlich geschützt |