Fabrication of 0.5 μm NMOS-devices by all level X-ray lithography

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Author:U. Mackens, Ulrich MeschederGND, F. Mund, H. Lüthje, H. Lifka, C.A.H. Juffermans, P.H. Woerlee, A.J. Walker
DOI:https://doi.org/10.1016/0167-9317(89)90020-8
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1989
Release Date:2018/03/05
Volume:09.1989
Issue:1-4
First Page:89
Last Page:92
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG