Influence of X-ray mask repair on pattern placement accuracy

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Author:H. Schaffer, Ulrich MeschederGND, U. Weigmann, H.-C. Petzold
DOI:https://doi.org/10.1016/0167-9317(90)90108-6
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1990
Release Date:2018/03/05
Volume:11.1990
Issue:1-4
First Page:251
Last Page:254
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG