X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features

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Author:H. Lüthje, A. Bruns, H. Harms, I. Köhler, Ulrich MeschederGND, U. Mackens, T. Stuck
DOI:https://doi.org/10.1016/0167-9317(90)90109-7
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1990
Release Date:2018/03/05
Volume:11.1990
Issue:1-4
First Page:255
Last Page:258
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG