Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication

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Author:Ulrich MeschederORCiDGND, U. Mackens, H. Lifka, R. Dammel, G. Pawloski, J. Theis
DOI:https://doi.org/10.1016/0167-9317(90)90155-M
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1990
Release Date:2018/03/05
Volume:11.1990
Issue:1-4
First Page:481
Last Page:485
Access Rights:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG