Linewidth metrology for x-ray masks with subhalfmicron feature size
| Author: | Ulrich MeschederORCiDGND, F. Mund, H.-L. Huber |
|---|---|
| DOI: | https://doi.org/10.1016/0167-9317(87)90101-8 |
| ISSN: | 0167-9317 |
| Parent Title (English): | Microelectronic Engineering |
| Document Type: | Article (peer-reviewed) |
| Language: | English |
| Year of Completion: | 1987 |
| Release Date: | 2018/03/14 |
| Volume: | 06.1987 |
| Issue: | 1-4 |
| First Page: | 653 |
| Last Page: | 659 |
| Open-Access-Status: | Closed Access |
| Licence (German): |  Urheberrechtlich geschützt |