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Stability of SiC-masks for high resolution synchrotron X-ray lithography

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Author:H. Lüthje, U. Mackens, Ulrich MeschederORCiDGND, B. Matthießen
DOI:https://doi.org/10.1016/0167-9317(86)90027-4
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:1986
Release Date:2018/03/08
Volume:05.1986
Issue:1-4
First Page:39
Open Access:Innerhalb der Hochschule
Licence (German):License LogoEs gilt das UrhG