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UPUR – A Metal-Free Combination of Several UPW Polishing Steps in a Multifunctional Reactor for the Removal of TOC and H2O2 Traces
| Author: | D. Gaupp, S. Keav, Philippe Rychen, Thomas OppenländerGND |
|---|---|
| Parent Title (English): | Ultrapure Micro 2018, May 30 - June 1, Austin, Texas, USA |
| Document Type: | Conference Proceeding |
| Language: | English |
| Year of Completion: | 2018 |
| Release Date: | 2018/05/30 |
| Tag: | UPW polishing; Ultra pure water; VUV-photoreactor |
| Licence (German): |  Urheberrechtlich geschützt |