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Verfahren und Vorrichtung zur photoinduzierten Kontrolle des anisotropen Ätzens von kristallinem Silizium

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Author:Ulrich MeschederORCiDGND, Christiane Kötter
Document Type:Other
Year of Completion:1998
Release Date:2018/09/06
Open Access:Frei verfügbar
Patent Number:DE000019811965A1
Country of Patent Application:Deutschland
Patent Application Year:1998
Patent Application:19.03.1998
Licence (German):License LogoEs gilt das UrhG