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Influence of current density on the adhesion of seedless electrodeposited copper layers on silicon

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Author:Frederico Lima, Ulrich MeschederORCiDGND, Harald Leiste, Müller Claas
DOI:https://doi.org/10.1016/j.surfcoat.2019.07.007
ISSN:0257-8972
Parent Title (English):Surface and Coatings Technology
Document Type:Article (peer-reviewed)
Language:English
Year of Completion:2019
Release Date:2019/12/12
Volume:375.2019
Issue:October
First Page:554
Last Page:564
Licence (German):License LogoUrheberrechtlich geschützt