Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication
| Author: | Ulrich MeschederORCiDGND, U. Mackens, H. Lifka, R. Dammel, G. Pawloski, J. Theis |
|---|---|
| DOI: | https://doi.org/10.1016/0167-9317(90)90155-M |
| ISSN: | 0167-9317 |
| Parent Title (English): | Microelectronic Engineering |
| Document Type: | Article (peer-reviewed) |
| Language: | English |
| Year of Completion: | 1990 |
| Release Date: | 2018/03/05 |
| Volume: | 11.1990 |
| Issue: | 1-4 |
| First Page: | 481 |
| Last Page: | 485 |
| Open-Access-Status: | Closed Access |
| Licence (German): |  Urheberrechtlich geschützt |