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Research and First Experiments on Self Assembled Monolayers (SAM) for Area-Selective Atomic Layer Deposition

  • This work gives the theoretical background which is needed to understand what self-assembling monolayers are, how they work, how and for what they can be used. A closer look is taken on the possibility to create an area selective atomic layer deposition process. In a practical experiment the foundation for this process is laid. Therefor a silicon wafer is coated with gold using a evaporation process. The gold samples are exposed to the SAMs solution to grow them. Contact angle measurements as well as Fourier transform Infrared spectroscopy are used to check the existence of SAMs on the gold samples. Also there is investigated if different exposure times make any differences.
Author:Aaron Urschel, Nicolai Simon, Volker BucherORCiDGND
Parent Title (English):HFU Master research projects
Document Type:Contribution to a Periodical
Year of Completion:2021
Release Date:2021/11/30
Article Number:1005
Page Number:3
Degree Program:MZT - Mikromedizintechnik
Open-Access-Status: Open Access 
Journals:HFU Master research projects
Licence (German):License LogoUrheberrechtlich geschützt