TY - JOUR U1 - Wissenschaftlicher Artikel A1 - Mescheder, Ulrich A1 - Mund, F. A1 - Huber, H.-L. T1 - Linewidth metrology for x-ray masks with subhalfmicron feature size JF - Microelectronic Engineering Y1 - 1987 SN - 0167-9317 SS - 0167-9317 U6 - https://doi.org/10.1016/0167-9317(87)90101-8 DO - https://doi.org/10.1016/0167-9317(87)90101-8 VL - 06.1987 IS - 1-4 SP - 653 EP - 659 ER -