TY - JOUR U1 - Wissenschaftlicher Artikel A1 - Betz, H. A1 - Huber, H.-L. A1 - Pongratz, S. A1 - Rohrmoser, W. A1 - Windbracke, W. A1 - Mescheder, Ulrich T1 - Silicon X-ray masks: Pattern placement and overlay accuracy JF - Microelectronic Engineering Y1 - 1986 SN - 0167-9317 SS - 0167-9317 U6 - https://doi.org/10.1016/0167-9317(86)90028-6 DO - https://doi.org/10.1016/0167-9317(86)90028-6 VL - 05.1986 IS - 1-4 SP - 41 EP - 49 ER -