@inproceedings{MeschederMackensMund1989,
  author    = {Ulrich Mescheder and U. Mackens and F. Mund},
  title     = {Investigation Of Linewidth Uniformity In X-Ray Lithography},
  series = {Proceedings of SPIE: Volume 1087; Integrated Circuit Metrology, Inspection, and Process Control III, Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States},
  isbn      = {0-8194-0122-6},
  pages     = {396 -- 406},
  year      = {1989},
  language  = {en}
}