TY  - JOUR
U1  - Wissenschaftlicher Artikel
A1  - Mescheder, Ulrich
A1  - Mackens, U.
A1  - Lifka, H.
A1  - Dammel, R.
A1  - Pawloski, G.
A1  - Theis, J.
T1  - Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication
JF  - Microelectronic Engineering
Y1  - 1990
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/0167-9317(90)90155-M
DO  - https://doi.org/10.1016/0167-9317(90)90155-M
VL  - 11.1990
IS  - 1-4
SP  - 481
EP  - 485
ER  -