@article{MeschederMackensLifkaetal.1990,
  author    = {Ulrich Mescheder and U. Mackens and H. Lifka and R. Dammel and G. Pawloski and J. Theis},
  title     = {Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication},
  series   = {Microelectronic Engineering},
  volume    = {11.1990},
  number    = {1-4},
  issn      = {0167-9317},
  doi       = {10.1016/0167-9317(90)90155-M},
  pages     = {481 -- 485},
  year      = {1990},
  language  = {en}
}