TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Huber, H.-L.
A1  - Pongratz, S.
A1  - Trube, J.
A1  - Windbracke, W.
A1  - Mescheder, Ulrich
A1  - Mund, F.
T1  - Sub‐half‐micron critical dimension control in x‐ray lithography mask technology
JF  - Journal of Vacuum Science & Technology B: Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Y1  - 1988
SN  - 2166-2754
SS  - 2166-2754
VL  - 06.1988
IS  - 6
SP  - 2184
EP  - 2189
ER  -