TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Pongratz, S.
A1  - Mescheder, Ulrich
A1  - Ehrlich, Ch.
A1  - Huber, H.-L.
A1  - Kohlmann, K.
A1  - Windbracke, W.
T1  - State of the art of pattern placement accuracy of silicon X-ray master masks
JF  - Microelectronic Engineering
Y1  - 1989
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/0167-9317(89)90027-0
DO  - https://doi.org/10.1016/0167-9317(89)90027-0
VL  - 09.1989
IS  - 1-4
SP  - 117
EP  - 120
ER  -