TY  - CHAP
U1  - Konferenzveröffentlichung
A1  - Mescheder, Ulrich
A1  - Mackens, U.
A1  - Mund, F.
T1  - Investigation Of Linewidth Uniformity In X-Ray Lithography
T2  - Proceedings of SPIE: Volume 1087; Integrated Circuit Metrology, Inspection, and Process Control III, Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States
Y1  - 1989
SN  - 0-8194-0122-6
SB  - 0-8194-0122-6
SP  - 396
EP  - 406
ER  -