TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Schaffer, H.
A1  - Mescheder, Ulrich
A1  - Weigmann, U.
A1  - Petzold, H.-C.
T1  - Influence of X-ray mask repair on pattern placement accuracy
JF  - Microelectronic Engineering
Y1  - 1990
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/0167-9317(90)90108-6
DO  - https://doi.org/10.1016/0167-9317(90)90108-6
VL  - 11.1990
IS  - 1-4
SP  - 251
EP  - 254
ER  -