TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Lüthje, H.
A1  - Mackens, U.
A1  - Mescheder, Ulrich
A1  - Matthießen, B.
T1  - Stability of SiC-masks for high resolution synchrotron X-ray lithography
JF  - Microelectronic Engineering
Y1  - 1986
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/0167-9317(86)90027-4
DO  - https://doi.org/10.1016/0167-9317(86)90027-4
VL  - 05.1986
IS  - 1-4
SP  - 39
ER  -