TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Lüthje, H.
A1  - Bruns, A.
A1  - Harms, H.
A1  - Köhler, I.
A1  - Mescheder, Ulrich
A1  - Mackens, U.
A1  - Stuck, T.
T1  - X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features
JF  - Microelectronic Engineering
Y1  - 1990
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/0167-9317(90)90109-7
DO  - https://doi.org/10.1016/0167-9317(90)90109-7
VL  - 11.1990
IS  - 1-4
SP  - 255
EP  - 258
ER  -