@article{LuethjeBrunsHarmsetal.1990,
  author    = {H. L{\"u}thje and A. Bruns and H. Harms and I. K{\"o}hler and Ulrich Mescheder and U. Mackens and T. Stuck},
  title     = {X-ray mask technology: Precise etching of sub-half-micron tungsten absorber features},
  series   = {Microelectronic Engineering},
  volume    = {11.1990},
  number    = {1-4},
  issn      = {0167-9317},
  doi       = {10.1016/0167-9317(90)90109-7},
  pages     = {255 -- 258},
  year      = {1990},
  language  = {en}
}